A multiple-cathode arc-discharge plasma source

Author

Clayton, Christopher E.

Author_Institution

Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA

Volume

19

Issue

6

fYear

1991

fDate

12/1/1991 12:00:00 AM

Firstpage

1244

Lastpage

1247

Abstract

A plasma source for obtaining a 1-cm length of high-fractional ionized plasmas with electron densities in the range of 10¹⁵-10¹⁷ cm^-3 is described. The source consists of a capacitive discharge between a metal anode and an array of small metal cathodes embedded in epoxy, each with a current-limiting resistor. The effect is to have an array of sources which merge into each other, producing the plasma as a whole. The design and performance of the plasma source are presented. The entire system consists of the main electrode and shielding structures, the preionization circuit, and the main discharge circuit. Each of these components is described and the operating parameters and results are given

Keywords

anodes; arcs (electric); cathodes; plasma production; capacitive discharge; current-limiting resistor; design; discharge circuit; metal anode; metal cathode array; multiple-cathode arc-discharge plasma source; performance; preionization circuit; shielding structures; Cathodes; Laser beams; Particle beams; Plasma accelerators; Plasma confinement; Plasma density; Plasma sources; Plasma transport processes; Plasma waves; Resistors;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.125046

Filename

125046