Title :
A theoretical investigation of the characteristic temperature T0 for semiconductor lasers
Author :
Witzigmann, Bernd ; Hybertsen, Mark S.
Author_Institution :
Ortel-A Div., Alhambra, CA, USA
Abstract :
The temperature dependence of the characteristic temperature T0 of semiconductor quantum-well lasers is investigated using detailed simulations. The critical-temperature-dependent processes are the optical gain and the nonradiative recombination. The gain model is based on k · p theory with the multiple quantum wells in the active layer represented by a superlattice. The Auger process is assumed to be thermally activated. It is shown that, with inclusion of the continuum state filling and interband mixing, the most important features experimentally observed in the temperature dependence of the T0 value can be explained. The continuum state filling and band nonparabolicity cause a significant deviation from the ideal linear carrier density versus temperature relation for quantum wells. The results are compared to experiment for broad area devices lasing at 980 nm and 1.3, and 1.55 μm, and show good agreement over a broad range of temperature.
Keywords :
Debye temperature; carrier density; current density; electron-hole recombination; energy gap; k.p calculations; quantum well lasers; spontaneous emission; 1.3 micron; 1.55 micron; 980 nm; band nonparabolicity; characteristic temperature; continuum state filling; dimensional rate equation; gain model; ideal linear carrier density; interband mixing; k·p theory; leakage current; multiple quantum wells; nonradiative recombination; optical gain; semiconductor quantum-well lasers; spontaneous emission coefficient; temperature dependence; thermally activated Auger process; Charge carrier density; Filling; Optical mixing; Optical superlattices; Quantum mechanics; Quantum well lasers; Radiative recombination; Semiconductor superlattices; Temperature dependence; Temperature distribution;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/JSTQE.2003.818859