DocumentCode :
836663
Title :
GEM-type detectors using LIGA and etchable glass technologies
Author :
Ahn, S.K. ; Kim, J.G. ; Perez-Mendez, V. ; Chang, S. ; Jackson, K.H. ; Kadyk, J.A. ; Wenzel, W.A. ; Cho, G.
Author_Institution :
Phys. Div., Lawrence Berkeley Nat. Lab., CA, USA
Volume :
49
Issue :
3
fYear :
2002
fDate :
6/1/2002 12:00:00 AM
Firstpage :
870
Lastpage :
874
Abstract :
Gas electron multipliers (GEMS) have been made by a deep X-ray lithography technique (LIGA process) using synchrotron radiation on polymethylmethacrylate (PMMA) and by ultraviolet (UV) processes using a UV etchable glass. The gain, stability, and rate capability for these detectors are described. The LIGA detectors described consist of PMMA sheets of various thicknesses, 125-350 μm, and have 150×150 μm2 holes spaced with a pitch of 300 μm. Thin copper electrodes are plated on the top and bottom surfaces using a Damascene method, followed by electroless plating of the copper onto a palladium-tin-base layer. For various thicknesses of PMMA, measurements have been made of absolute gain versus voltage, time stability of gain, and rate capability. The operating gas mixture was usually Ar/CO2 (70/30) gas, but some tests were also done using P10 gas. We also made GEM-like detectors using the UV etchable glass called Foturan, patterned by exposure to UV light and subsequent etching. A few measurements using these detectors will be reported, including avalanche gain and time stability.
Keywords :
LIGA; drift chambers; etching; Ar-CO2; Damascene method; Foturan; GEMSs; LIGA process; PMMA; UV etchable glass; avalanche gain; deep X-ray lithography technique; etching; gas electron multipliers; operating gas mixture; polymethylmethacrylate; rate capability; synchrotron radiation; time stability; ultraviolet processes; Copper; Detectors; Electron multipliers; Etching; Gain measurement; Glass; Stability; Synchrotron radiation; Time measurement; X-ray lithography;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2002.1039581
Filename :
1039581
Link To Document :
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