DocumentCode
836773
Title
Pulse intense metal-ion diode with a vacuum arc plasma anode
Author
Nakagawa, Yoshiro
Author_Institution
Dept. of Electr. Eng., Osaka City Univ., Osaka, Japan
Volume
19
Issue
6
fYear
1991
fDate
12/1/1991 12:00:00 AM
Firstpage
1267
Lastpage
1271
Abstract
An intense pulsed ion beam of metal was extracted from a magnetically insulated ion diode operated in a mode of plasma prefill generated from a vacuum arc discharge, anode plasma source. With this ion diode, an intense metal-ion beam of a high melting-point metal (Ta) was obtained. A variety of operational modes appeared, depending on the amount of plasma in the diode gap at the initiation of the high-voltage pulse. The energy, current, and duration time of the ion beam were 20~100 keV, ~1 kA, and 1 μs, respectively. Measurements of ions were performed with an ion energy analyzer or a biased ion collector located at the end of a long drift tube and a Thomson parabola ion spectrometer. The Ta ions in the first to fifth states of ionization were detected accompanied by C+, O+, F+, and H+ . A Ta ion beam current of about half the total ion flux was obtained in this experiment
Keywords
arcs (electric); beam handling techniques; ion beams; particle beam diagnostics; plasma applications; 1 kA; 1 mus; 20 to 100 keV; C+; F+; H+; O+; Ta; Thomson parabola ion spectrometer; biased ion collector; discharge; drift tube; high melting-point metal; intense pulsed ion beam; ion energy analyzer; magnetically insulated ion diode; plasma prefill; pulse intense metal-ion diode; vacuum arc plasma anode; Anodes; Arc discharges; Diodes; Insulation; Ion beams; Magnetic flux; Plasma measurements; Plasma sources; Pulse generation; Vacuum arcs;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.125050
Filename
125050
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