• DocumentCode
    836773
  • Title

    Pulse intense metal-ion diode with a vacuum arc plasma anode

  • Author

    Nakagawa, Yoshiro

  • Author_Institution
    Dept. of Electr. Eng., Osaka City Univ., Osaka, Japan
  • Volume
    19
  • Issue
    6
  • fYear
    1991
  • fDate
    12/1/1991 12:00:00 AM
  • Firstpage
    1267
  • Lastpage
    1271
  • Abstract
    An intense pulsed ion beam of metal was extracted from a magnetically insulated ion diode operated in a mode of plasma prefill generated from a vacuum arc discharge, anode plasma source. With this ion diode, an intense metal-ion beam of a high melting-point metal (Ta) was obtained. A variety of operational modes appeared, depending on the amount of plasma in the diode gap at the initiation of the high-voltage pulse. The energy, current, and duration time of the ion beam were 20~100 keV, ~1 kA, and 1 μs, respectively. Measurements of ions were performed with an ion energy analyzer or a biased ion collector located at the end of a long drift tube and a Thomson parabola ion spectrometer. The Ta ions in the first to fifth states of ionization were detected accompanied by C+, O+, F+, and H+ . A Ta ion beam current of about half the total ion flux was obtained in this experiment
  • Keywords
    arcs (electric); beam handling techniques; ion beams; particle beam diagnostics; plasma applications; 1 kA; 1 mus; 20 to 100 keV; C+; F+; H+; O+; Ta; Thomson parabola ion spectrometer; biased ion collector; discharge; drift tube; high melting-point metal; intense pulsed ion beam; ion energy analyzer; magnetically insulated ion diode; plasma prefill; pulse intense metal-ion diode; vacuum arc plasma anode; Anodes; Arc discharges; Diodes; Insulation; Ion beams; Magnetic flux; Plasma measurements; Plasma sources; Pulse generation; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.125050
  • Filename
    125050