Title :
The response of a microwave multipolar bucket plasma to a high voltage pulse
Author :
Qin, Shu ; Chan, Chung ; McGruer, Nicol E. ; Browning, Jim ; Warner, Keith
Author_Institution :
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
fDate :
12/1/1991 12:00:00 AM
Abstract :
A collisional model that describes the response of a microwave multipolar bucket plasma to a high voltage pulse is developed for plasma source ion implantation (PSII). The primary purpose is to develop a theoretical model of PSII plasma physics to be used in conjunction with a model of ion-target interaction to optimize PSII processing. Measurements of the sheath position and target current in a 100 mtorr helium plasma are found to be consistent with the model. Sheath thicknesses predicted by the collisional model are significantly less than those predicted by similar noncollisional models
Keywords :
ion implantation; plasma applications; plasma collision processes; plasma diagnostics; plasma production; plasma sheaths; plasma simulation; plasma-wall interactions; 100 mtorr; collisional model; high voltage pulse; ion-target interaction; microwave multipolar bucket plasma; plasma source ion implantation; response; sheath position; sheath thickness; target current; Current measurement; Ion implantation; Physics; Plasma immersion ion implantation; Plasma materials processing; Plasma measurements; Plasma sheaths; Plasma sources; Predictive models; Voltage;
Journal_Title :
Plasma Science, IEEE Transactions on
