• DocumentCode
    837436
  • Title

    High-temperature defect structure of Cd- and Te-rich CdTe

  • Author

    Grill, R. ; Franc, J. ; Höschl, P. ; Turkevych, I. ; Belas, E. ; Moravec, P. ; Fiederle, M. ; Benz, K.W.

  • Author_Institution
    Inst. of Phys., Charles Univ., Prague, Czech Republic
  • Volume
    49
  • Issue
    3
  • fYear
    2002
  • fDate
    6/1/2002 12:00:00 AM
  • Firstpage
    1270
  • Lastpage
    1274
  • Abstract
    Quasi-chemical formalism is used to evaluate high temperature (600°C-1000°C) in situ conductivity and Hall effect measurements and simultaneously tellurium atom fraction in CdTe along the three-phase curve. We show that the electric properties can be described only by two native defects-cadmium interstitial as the divalent donor and cadmium vacancy as the divalent acceptor. Close to Te saturation, another native defect must be involved in the model to allow the deviation from the stoichiometry irrespective of the low density of electrically charged defects. Deep divalent donor TeCd having both levels near or below the midgap best describes all the high-temperature experimental data.
  • Keywords
    Boltzmann equation; Hall effect; II-VI semiconductors; cadmium compounds; charge compensation; defect states; interstitials; stoichiometry; vacancies (crystal); 600 to 1000 C; Boltzmann equation; CdTe; Hall effect; cadmium interstitial; cadmium vacancy; defect formation energy; divalent acceptor; divalent donor; electric neutrality condition; electrically charged defects; galvanomagnetic properties; high-temperature defect structure; in situ conductivity; ionization energy; native defects; quasichemical formalism; stoichiometry; tellurium atom fraction; three-phase curve; Atomic measurements; Cadmium; Conductivity measurement; Crystalline materials; Crystals; Hall effect; Impurities; Mechanical factors; Tellurium; Temperature;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2002.1039650
  • Filename
    1039650