DocumentCode :
839476
Title :
Stress Reduction and Enhanced Extraction Efficiency of GaN-Based LED Grown on Cone-Shape-Patterned Sapphire
Author :
Lee, Jae-Hoon ; Oh, J.T. ; Kim, Y.C. ; Lee, Jung-Hee
Author_Institution :
Opto Syst. Div., Samsung Electro-Mech. Co., Ltd., Suwon
Volume :
20
Issue :
18
fYear :
2008
Firstpage :
1563
Lastpage :
1565
Abstract :
High-quality InGaN-GaN film was grown on a cone-shape-patterned sapphire substrate (CSPSS) by using metal-oganic chemical vapor deposition. The growth mode of GaN on CSPSS was similar to that of the epitaxial lateral overgrowth (ELOG), because the growth, in the initial stage, proceeds only on flat basal sapphire substrate and there is no preferential growth plane on the cone region. An analysis of X-ray diffraction showed a shorter lattice constant of 5.1877 Aring along the c-axis for the GaN thin films grown on CSPSS, compared to 5.1913 A for the samples grown on a conventional sapphire substrate (CSS). This is because the ELOG-like mode of the GaN layer over the cone-shaped region results in less lattice mismatch and incoherency between the GaN layer and the sapphire substrate. The output power of a sideview light-emitting diode (LED) grown on CSPSS was estimated to be 7.3 mW at a forward current of 20 mA, which is improved by 34% compared to that of an LED grown on CSS. The significant enhancement in output power is attributed to both the increase of the extraction efficiency, resulted from the increase in photon escaping probability due to enhanced light scattering at the CSPSS, and the improvement of the crystal quality due to the reduction of dislocation.
Keywords :
III-V semiconductors; MOCVD; X-ray diffraction; dislocations; gallium compounds; indium compounds; lattice constants; light emitting diodes; semiconductor thin films; Al2O3; InGaN-GaN; X-ray diffraction; cone-shape-patterned sapphire substrate; crystal quality; current 20 mA; dislocation reduction; enhanced extraction efficiency; lattice constant; lattice mismatch; light-emitting diode; metal-oganic chemical vapor deposition; stress reduction; Cascading style sheets; Chemical vapor deposition; Gallium nitride; Lattices; Light emitting diodes; Photonic crystals; Power generation; Stress; Substrates; X-ray diffraction; Dislocation; GaN; lattice constant; light-emitting diode (LED); patterned sapphire;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2008.928844
Filename :
4603049
Link To Document :
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