• DocumentCode
    840143
  • Title

    High Intensity Beam Profile Monitors for the LAMPF Primary Beam Lines

  • Author

    Hoffman, E.W. ; Macek, R.J. ; van Dyck, O. ; Lee, D. ; Harvey, A. ; Bridge, J. ; Caine, J.

  • Volume
    26
  • Issue
    3
  • fYear
    1979
  • fDate
    6/1/1979 12:00:00 AM
  • Firstpage
    3420
  • Lastpage
    3422
  • Abstract
    Two types of beam profile monitors are in use at LAMPF to measure the properties of the 800 MeV, 500 ¿A proton beam external to the linac. Both types use secondary electron emission from a wire to produce a current signal proportional to the amount of proton beam that intercepts the wire. The wire scanner system uses a pair of orthogonal wires which are passed through the beam and the harp system uses two fixed planes of parallel wires. Most of the harps are not retractable and are exposed continuously to the primary beam. The high beam intensities available lead to a number of technical problems for instruments that intercept the beam or are close to primary beam targets. The thermal, electrical, radiation-damage, and material selection problems encountered, and some solutions which have been implemented are discussed.
  • Keywords
    Actuators; Assembly; Bridges; Electron emission; Elementary particle vacuum; Particle beam measurements; Particle beams; Silicon carbide; Thermal expansion; Wire;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1979.4330056
  • Filename
    4330056