DocumentCode :
840143
Title :
High Intensity Beam Profile Monitors for the LAMPF Primary Beam Lines
Author :
Hoffman, E.W. ; Macek, R.J. ; van Dyck, O. ; Lee, D. ; Harvey, A. ; Bridge, J. ; Caine, J.
Volume :
26
Issue :
3
fYear :
1979
fDate :
6/1/1979 12:00:00 AM
Firstpage :
3420
Lastpage :
3422
Abstract :
Two types of beam profile monitors are in use at LAMPF to measure the properties of the 800 MeV, 500 ¿A proton beam external to the linac. Both types use secondary electron emission from a wire to produce a current signal proportional to the amount of proton beam that intercepts the wire. The wire scanner system uses a pair of orthogonal wires which are passed through the beam and the harp system uses two fixed planes of parallel wires. Most of the harps are not retractable and are exposed continuously to the primary beam. The high beam intensities available lead to a number of technical problems for instruments that intercept the beam or are close to primary beam targets. The thermal, electrical, radiation-damage, and material selection problems encountered, and some solutions which have been implemented are discussed.
Keywords :
Actuators; Assembly; Bridges; Electron emission; Elementary particle vacuum; Particle beam measurements; Particle beams; Silicon carbide; Thermal expansion; Wire;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1979.4330056
Filename :
4330056
Link To Document :
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