DocumentCode
840143
Title
High Intensity Beam Profile Monitors for the LAMPF Primary Beam Lines
Author
Hoffman, E.W. ; Macek, R.J. ; van Dyck, O. ; Lee, D. ; Harvey, A. ; Bridge, J. ; Caine, J.
Volume
26
Issue
3
fYear
1979
fDate
6/1/1979 12:00:00 AM
Firstpage
3420
Lastpage
3422
Abstract
Two types of beam profile monitors are in use at LAMPF to measure the properties of the 800 MeV, 500 ¿A proton beam external to the linac. Both types use secondary electron emission from a wire to produce a current signal proportional to the amount of proton beam that intercepts the wire. The wire scanner system uses a pair of orthogonal wires which are passed through the beam and the harp system uses two fixed planes of parallel wires. Most of the harps are not retractable and are exposed continuously to the primary beam. The high beam intensities available lead to a number of technical problems for instruments that intercept the beam or are close to primary beam targets. The thermal, electrical, radiation-damage, and material selection problems encountered, and some solutions which have been implemented are discussed.
Keywords
Actuators; Assembly; Bridges; Electron emission; Elementary particle vacuum; Particle beam measurements; Particle beams; Silicon carbide; Thermal expansion; Wire;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1979.4330056
Filename
4330056
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