• DocumentCode
    840805
  • Title

    The Grand Pareto: A Methodology for Identifying and Quantifying Yield Detractors in Volume Semiconductor Manufacturing

  • Author

    Desineni, Rao ; Berndlmaier, Zachary ; Winslow, Jonathan ; Blauberg, Alisa ; Chu, Benjamin R.

  • Author_Institution
    IBM Corp., Hopewell Junction, NY
  • Volume
    20
  • Issue
    2
  • fYear
    2007
  • fDate
    5/1/2007 12:00:00 AM
  • Firstpage
    87
  • Lastpage
    100
  • Abstract
    A method of communicating a unified pareto, we call "Grand Pareto," for technology-wide failure mechanisms that limit the profitability of a fabrication facility is presented. The Grand Pareto leverages multiple defect detection and isolation techniques in conjunction with state-of-the-art physical failure analysis and statistical yield analysis techniques to create a single message for the process community to drive the yield improvement efforts. The methodology has been successfully deployed at IBM where it has been assisting identification of key yield detractors for several high-end microprocessors in volume production
  • Keywords
    Pareto analysis; failure analysis; fault diagnosis; integrated circuit yield; isolation technology; Grand Pareto method; fabrication facility; high-end microprocessors; isolation techniques; multiple defect detection; physical failure analysis; semiconductor manufacturing; statistical yield analysis techniques; technology-wide failure mechanisms; yield detractors; Fabrication; Failure analysis; Inspection; Isolation technology; Manufacturing; Production facilities; Profitability; Semiconductor device manufacture; Systematics; Testing; Defect pareto; diagnosis; failure analysis; yield enhancement; yield learning;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2007.896641
  • Filename
    4182425