Title :
CMOS RF Design for Reliability Using Adaptive Gate–Source Biasing
Author :
Yuan, J.S. ; Tang, H.
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Central Florida Univ., Orlando, FL
Abstract :
An adaptive gate-source biasing scheme to improve the MOSFET RF circuit reliability is presented. The adaptive method automatically adjusts the gate-source voltage to compensate the reduction in the drain current subjected to various device reliability mechanisms. The MOS DC circuit using the adaptive technique is less sensitive to a threshold voltage and mobility degradations from a long-term stress effect. A class-AB RF power amplifier example shows that the use of a source resistance makes the power-added efficiency robust against the threshold voltage and mobility variations, whereas the use of a source inductance is more reliable for the input third-order intercept point.
Keywords :
CMOS integrated circuits; MOSFET; inductance; integrated circuit design; integrated circuit reliability; power amplifiers; radiofrequency amplifiers; radiofrequency integrated circuits; semiconductor device reliability; CMOS RF design; MOS DC circuit; MOSFET RF circuit reliability; adaptive gate-source biasing scheme; adaptive technique; class-AB RF power amplifier; device reliability mechanisms; drain current; gate-source voltage; mobility variations; power-added efficiency; source inductance; source resistance; third-order intercept point; threshold voltage; Circuits; Degradation; MOSFETs; Niobium compounds; Power amplifiers; Radio frequency; Radiofrequency amplifiers; Stress; Threshold voltage; Titanium compounds; Adaptive biasing; channel hot electron (CHE); gate oxide breakdown; negative-bias temperature instability (NBTI); power amplifier; power-added efficiency; radio frequency (RF); third-order intercept point;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2008.928024