DocumentCode :
841614
Title :
Loss-Reduction in Flexibly Vertical Coupled Ring Lasers Through Asymmetric Double Shallow Ridge and ICP/ICP Cascade Etching
Author :
Zhang, R. ; Ren, Z. ; Yu, S.
Author_Institution :
Div. of Nano-devices & Nano-Mater., Chinese Acad. of Sci., Suzhou
Volume :
20
Issue :
22
fYear :
2008
Firstpage :
1821
Lastpage :
1823
Abstract :
Loss-reduction in flexibly vertical coupled ring lasers is demonstrated through asymmetric double shallow ridge in the main ring area and inductively coupled plasma (ICP)/ICP cascade etching. Compared with the previous counterpart, the reduced threshold current and enhanced output power are obtained; coupling ratio is tuned from 27% to 1.5% when threshold current is varied from 60 to 80 mA. Single-mode lasing with sidemode-suppression ratio of 27 dB and quality factor of 13120 is achieved when I c=15 mA, I d=58 mA, which are nearly twofolds of that in the previous one. Such strategies can be widely employed to reduce loss in other vertical coupled photonic circuits.
Keywords :
laser beams; laser modes; optical fabrication; ridge waveguides; ring lasers; semiconductor lasers; sputter etching; waveguide lasers; ICP/ICP cascade etching; asymmetric double shallow ridge; flexibly vertical coupled ring lasers; inductively coupled plasma; loss reduction; main ring area; Active vertical coupler (AVC); asymmetrical double shallow ridge; inductively coupled plasma (ICP)/ICP etching; rectangular ring laser;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2008.2003396
Filename :
4604679
Link To Document :
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