DocumentCode :
841738
Title :
Use of SrTiO3 as a single buffer layer for RABiTS YBCO coated conductor
Author :
Chung, Jun-Ki ; Ko, Rock-Kil ; Shi, Dong-Qi ; Ha, Hong-Soo ; Kim, Hosup ; Song, Kyu-Jeong ; Park, Chan ; Moon, Seung-Hyun ; Yoo, Sang-Im
Author_Institution :
Inst. of Ind. Technol., Changwon Nat. Univ., Kyungnam, South Korea
Volume :
15
Issue :
2
fYear :
2005
fDate :
6/1/2005 12:00:00 AM
Firstpage :
3020
Lastpage :
3023
Abstract :
SrTiO3 (STO) films were epitaxially deposited by PLD on textured Ni-3wt%W (Ni-3W) substrates. The STO film was deposited in two steps-reducing atmosphere first, and then oxidizing atmosphere-to prevent the oxidation of the metal surface from hindering the epitaxial relationship between the film and the substrate. The deposited STO films exhibited sharp biaxial texture and dense surface. YBCO films were epitaxially deposited on STO/Ni-3W and showed Jc(77K, self field)=1.2MA/cm2 and Tc(onset)=88 K. Auger electron spectrometry depth profile analyses show that the STO film can block the diffusion of the metal from the substrate. This work has shown that STO films epitaxially deposited on textured Ni-3W substrate can be used as a single buffer layer of the high current carrying YBCO coated conductor.
Keywords :
buffer layers; electron spectrometers; epitaxial growth; high-temperature superconductors; interface structure; nickel compounds; strontium compounds; surface diffusion; yttrium compounds; Auger electron spectrometry depth profile analyses; Ni-W; PLD; RABiTS; STO films; SrTiO3; YBCO coated conductor; YBCO films; YBa2Cu3O7; biaxial texture; dense surface; metal surface; oxidizing atmosphere; single buffer layer; steps-reducing atmosphere; Buffer layers; Chemicals; Conducting materials; Conductive films; Conductors; High temperature superconductors; Substrates; Superconducting epitaxial layers; Superconducting films; Yttrium barium copper oxide; Coated conductors; PLD; YBCO; single buffer layer;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2005.848709
Filename :
1440305
Link To Document :
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