Deposition of Gd2O3 buffer layers on Ni-based substrates by aerosol spray pyrolysis

Aerosol spray pyrolysis (ASP) was used to deposit Gd₂O₃ on pure Ni and Ni(5at%W). The H₂:H₂O ratio in the gas stream, consisting of forming gas + the aqueous nitrate mist, was adjusted to 0.75, which prevented the Ni(W) substrate from oxidizing. A dense, ∼600 nm thick layer of Gd₂O₃ could be deposited on a textured Ni(5at%W) substrate at 900°C in 20 min. The Gd₂O₃ was not textured and the surface was rough.