Title :
Ultraviolet Electroluminescence From n-ZnO–SiO
–ZnO Nanocomposite/p-GaN Heterojunction Light-Emitting Diodes at Forward and Reverse Bias
Author :
Wu, M.K. ; Shih, Y.T. ; Li, W.C. ; Chen, H.C. ; Chen, M.J. ; Kuan, H. ; Yang, J.R. ; Shiojiri, M.
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ., Taipei
Abstract :
Ultraviolet (UV) light-emitting diodes composed of n-ZnO:Al-SiO2-ZnO nanocomposite/p-GaN:Mg heterojunction were fabricated on the (0002) Al2O3 substrate. A SiO2 layer embedded with ZnO nanodots was prepared on the p-type GaN using spin-on coating of SiO2 nanoparticles together with atomic layer deposition (ALD). An n-type Al-doped ZnO layer was deposited also by ALD. The SiO2-ZnO nanocomposite layer accomplishes a role of the current blocking layer and also causes, by its low refractive index, the increase in the light extraction efficiency from n-ZnO. Significant UV electroluminescence from n-ZnO was achieved at a low forward-bias current of 1.8 mA. Strong UV emission arising from impact ionization in GaN, ZnO, and GaN:Mg states was also observed at reverse breakdown bias.
Keywords :
II-VI semiconductors; III-V semiconductors; atomic layer deposition; electroluminescence; electroluminescent devices; gallium compounds; light emitting diodes; nanocomposites; nanoparticles; semiconductor heterojunctions; silicon compounds; wide band gap semiconductors; zinc compounds; (ZnO-SiO2-ZnO)-GaN; atomic layer deposition; current 1.8 mA; heterojunction; light-emitting diodes; nanocomposite; nanodots; nanoparticles; spin-on coating; ultraviolet electroluminescence; Atomic layer deposition (ALD); ultraviolet (UV) light-emitting diode (LED); zinc oxide (ZnO);
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2008.2004687