DocumentCode :
842346
Title :
Measurement and comparison of 1/f noise and g-r noise in silicon homojunction and III-V heterojunction bipolar transistors
Author :
Kirtania, Ashish K. ; Das, Mukunda B. ; Chandrasekhar, S. ; Lunardi, Leda M. ; Qua, G.J. ; Hamm, R.A. ; Yang, Li-Wu
Author_Institution :
Dept. of Electr. Eng., Pennsylvania State Univ., University Park, PA, USA
Volume :
43
Issue :
5
fYear :
1996
fDate :
5/1/1996 12:00:00 AM
Firstpage :
784
Lastpage :
792
Abstract :
This paper experimentally determines and compares the 1/f noise and the g-r noise, as components of the base noise current spectral density, in Si homojunction and III-V heterojunction bipolar transistors (HBTs) in common-emitter configuration. The noise spectra for each of these devices are obtained as functions of the base bias current (IB), and the 1/f noise has been found to depend on IB as IBγ, where γ~1.8 for the silicon BJT´s and InP/InGaAs HBT´s with high current gains (β~50), and γ~1.1 for the AlGaAs/GaAs HBTs with low current gains (4<β<12). The nearly constant current gain and the near square-law and inverse-square emitter area dependence of 1/f noise in silicon devices are indicative of the dominant base bulk recombination nature of this noise. The 1/f noise in the InP based HBTs has been found to be lowest among all the devices we have tested, and its origin is suggested to be the base bulk recombination as in the Si devices. For the AlGaAs/GaAs HBTs, the low current gain and the near unity value of γ, arise most likely due to the combined effects of surface, bulk, and depletion region recombinations and the base-to-emitter injection. The dependence of the 1/f noise on the base current density in the devices tested in this work, and those tested by others are compared to find out which HBT´s have achieved the lowest level of 1/f noise
Keywords :
1/f noise; III-V semiconductors; bipolar transistors; electron-hole recombination; elemental semiconductors; heterojunction bipolar transistors; semiconductor device noise; silicon; 1/f noise; AlGaAs-GaAs; III-V heterojunction bipolar transistors; InP-InGaAs; Si; current gain; generation-recombination noise; silicon homojunction bipolar transistors; Current density; Gallium arsenide; Heterojunction bipolar transistors; III-V semiconductor materials; Indium gallium arsenide; Indium phosphide; Noise level; Noise measurement; Silicon devices; Testing;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.491256
Filename :
491256
Link To Document :
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