Title :
Superconducting and microstructural properties of two types of MgB2 films prepared by pulsed laser deposition
Author :
Zhao, Yue ; Ionescu, Mihail ; Roussel, Marie ; Pan, Alexey V. ; Horvat, Josip ; Dou, Shi X.
Author_Institution :
Inst. for Supercond. & Electron. Mater., Univ. of Wollongong, NSW, Australia
fDate :
6/1/2005 12:00:00 AM
Abstract :
Significant differences in superconducting and microstructural properties between two types of MgB2 films prepared by pulsed laser deposition were determined. A very high Hc2-T slope of 1.1 T/K was achieved in the in situ film. The Jc-H curves of the in situ film also show a much weaker field dependence than that of the ex situ film. The magneto-optical (MO) images show that at 4 K the flux penetrates the in situ MgB2 film through random paths, while for the ex situ film, the flux penetration pattern is mostly repeatable, indicating a defect-controlled flux penetration. Microstructural study (transmission electron microscopy and atomic force microscopy) revealed a relatively big grain size in the ex situ film. The correlation between the superconducting properties, microstructure and preparation conditions is discussed with regard to the two types of films.
Keywords :
atomic force microscopy; critical current density (superconductivity); grain size; magnesium compounds; pulsed laser deposition; superconducting critical field; superconducting thin films; transmission electron microscopy; type II superconductors; 4 K; MgB2; atomic force microscopy; critical current density; critical field; magneto-optical images; microstructural property; pulsed laser deposition; superconducting films; superconducting property; transmission electron microscopy; Annealing; Atomic force microscopy; Australia; Microstructure; Optical pulses; Pulsed laser deposition; Superconducting epitaxial layers; Superconducting films; Superconducting materials; Transmission electron microscopy; Magneto-optic imaging; superconducting; transmission electron microscopy;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
DOI :
10.1109/TASC.2005.848847