• DocumentCode
    844354
  • Title

    Discharge characteristics of cross-shaped microdischarge cells in ac-plasma display panel

  • Author

    Kim, Bo-Sung ; Cho, Ki-Duck ; Tae, Heung-Sik ; Jang, Sang-Hun ; Kim, Young-Mo

  • Author_Institution
    Sch. of Electron. & Electr. Eng., Kyungpook Nat. Univ., Daegu, South Korea
  • Volume
    33
  • Issue
    3
  • fYear
    2005
  • fDate
    6/1/2005 12:00:00 AM
  • Firstpage
    1053
  • Lastpage
    1060
  • Abstract
    This paper proposes a highly efficient cross-shaped cell structure to improve the luminous efficiency of an alternate current plasma display panel (ac-PDP). The microdischarge characteristics of the proposed structure are examined in an all-green 6-in test panel with various pressures and Xe-concentrations. Since the proposed cross-shaped cell structure has a longer Indium Tin Oxide (ITO) path between the two sustain electrodes and wider sidewall phosphor area, the following microdischarge characteristics were observed when compared with the conventional stripe-type cell structure. First, the sustain voltage margin was lower by about 15 V under a high Xe-concentration of 10%. Second, the rate of increase in the luminous efficiency was higher with a high pressure and high Xe-concentration. Finally, when adopting an auxiliary address pulse driving scheme, the luminous efficiency was improved by about 44% (2.38 lm/W) with a high Xe-concentration of 10%.
  • Keywords
    brightness; discharges (electric); phosphors; plasma displays; alternate current plasma display panel; auxiliary address pulse; cross-shaped microdischarge cells; indium tin oxide path; luminous efficiency; phosphor; stripe-type cell structure; sustain electrodes; sustain voltage margin; Digital TV; Electrodes; Indium tin oxide; Phosphors; Plasma chemistry; Plasma displays; Pulse measurements; Surface discharges; Testing; Voltage; Alternate current plasma display panel (ac PDP); cross-shaped cell structure; delta pixel; high Xe-concentration; high luminous efficiency; long Indium Tin Oxide (ITO) path; wide phosphor area;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2005.848621
  • Filename
    1440542