Title :
Nanoscale Magnification and Shape Control System for Precision Overlay in Jet and Flash Imprint Lithography
Author :
Cherala, Anshuman ; Schumaker, Philip ; Mokaberi, Babak ; Selinidis, Kosta ; Byung Jin Choi ; Meissl, Mario J. ; Khusnatdinov, Niyaz N. ; LaBrake, Dwayne ; Sreenivasan, S.V.
Author_Institution :
Technol. R&D, Mol. Imprints, Inc., Austin, TX, USA
Abstract :
Jet and flash imprint lithography steppers have demonstrated unprecedented capability for patterning of sub-25-nm features for semiconductor manufacturing. A critical requirement for such patterning is the ability to overlay one layer of a device to a previously printed layer. In this paper, the design and development of a nanoprecision mask magnification/shape control system (MSCS) for the unique requirements of imprint-based overlay is presented. Imprint specific topics such as in-liquid overlay and distortions, and on-tool overlay metrology are discussed. The MSCS presented here has demonstrated 10-nm mix and match overlay (mean + 3 sigma) capability that approaches performance of state-of-the-art photolithography tools.
Keywords :
masks; nanolithography; nanopatterning; photolithography; imprint-based overlay; in-liquid overlay; jet-flash imprint lithography; mix and match overlay; nanoprecision mask MSCS; nanoprecision mask magnification-shape control system; nanoscale magnification-shape control system; on-tool overlay metrology; patterning; precision overlay; printed layer; semiconductor manufacturing; size 10 nm; size 25 nm; state-of-the-art photolithography tool; Actuators; Force; Joints; Liquids; Lithography; Resists; Shape control; In-liquid alignment and overlay systems; jet and flash imprint lithography (J-FIL); precision magnification and shape control systems;
Journal_Title :
Mechatronics, IEEE/ASME Transactions on
DOI :
10.1109/TMECH.2013.2297679
