DocumentCode :
845622
Title :
A Universal Negative or Positive Ion Source
Author :
Alton, G.D.
Author_Institution :
Oak Ridge National Laboratory Oak Ridge, Tennessee 37830
Volume :
26
Issue :
3
fYear :
1979
fDate :
6/1/1979 12:00:00 AM
Firstpage :
3708
Lastpage :
3712
Abstract :
This report describes a multipurpose negative or positive ion source which can be used in a variety of low energy or high energy research applications. Conversion from negative/positive modes of operation can be accomplished by simply reversing the polarities of pertinent extraction and beam transport power supplies. Preliminary results obtained from recent evaluative studies along with design details and negative and positive yields observed to data are given. Thus far, the source has demonstrated ¿A intensity capabilities for several negative and positive ion species including C-, Cu-, Au-, N+, N2+, P+, A+, and Cs+.
Keywords :
Apertures; Electrons; Ion beams; Ion sources; Ionization; Plasma materials processing; Plasma sheaths; Plasma sources; Plasma temperature; Sputtering;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1979.4330587
Filename :
4330587
Link To Document :
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