• DocumentCode
    84606
  • Title

    Design and Fabrication of Wide Wavelength Range 25.8-Gb/S, 1.3-μM, Push-Pull-Driven DMLs

  • Author

    Kobayashi, Wataru ; Fujisawa, T. ; Tsuzuki, Ken ; Ohiso, Y. ; Ito, Takao ; Kanazawa, S. ; Yamanaka, T. ; Sanjoh, H.

  • Author_Institution
    NTT Photonics Labs., NTT Corp., Atsugi, Japan
  • Volume
    32
  • Issue
    1
  • fYear
    2014
  • fDate
    Jan.1, 2014
  • Firstpage
    3
  • Lastpage
    9
  • Abstract
    We design and fabricate wide wavelength range directly modulated lasers (DMLs) on the same InP wafer to realize a large-capacity monolithically integrated light source array up to 1 Tb/s. We demonstrate a 25.8-Gb/s push-pull operation over a 30-nm wavelength range, which is conventionally about 14 nm for 100 GbE applications. To extend the operating wavelength range, we design the wavelength dependence of the differential gain (∂G/∂n) for an InGaAlAs multiple quantum well structure, and realize high frequency relaxation oscillation resulting from the high differential gain over a wide range. Next, we also design the wavelength detuning (Δλ) under an operating injection current condition by taking account of the thermal effect of the chip, because Δλ determines ∂G/∂n, and the threshold current of the laser diode (LD). In addition, to achieve a 25.8-Gb/s push-pull operation, we fabricate a ridge waveguide structure buried in benzocyclobutene (BCB) with a low parasitic capacitance, and electrically isolate the DML from the neighboring chip by etching off n-InP. By using this design and structure, we achieve a 3-dB-down frequency bandwidth of over 20 GHz from 1290 to 1320 nm. We also achieve a mean output power of 8.0 dBm, and a dynamic extinction ratio of 5 dB. We measure the 25.8-Gb/s transmission characteristics, and obtain clear eye openings for a back-to-back configuration. We also measure the bit-error-rate performance, and obtain error-free operation for a 30-nm operating wavelength range.
  • Keywords
    aluminium compounds; capacitance; error statistics; etching; gallium arsenide; indium compounds; integrated optoelectronics; laser tuning; optical fabrication; optical modulation; quantum well lasers; ridge waveguides; semiconductor laser arrays; waveguide lasers; InGaAlAs; InP; InP wafer; back-to-back configuration; benzocyclobutene; bit rate 25.8 Gbit/s; bit-error-rate performance; chip; differential gain; dynamic extinction ratio; error-free operation; etching; frequency bandwidth; high frequency relaxation oscillation; large-capacity monolithically integrated light source array; laser diode; multiple quantum well structure; operating injection current condition; parasitic capacitance; push-pull operation; ridge waveguide structure; thermal effect; threshold current; transmission characteristics; wavelength 1290 nm to 1320 nm; wavelength 30 nm; wavelength dependence; wavelength detuning; wide wavelength range di- rectly modulated lasers; wide wavelength range push-pull-driven DML; Arrays; Cavity resonators; Lasers; Light sources; Materials; Resistance; Wavelength measurement; Direct modulation; InGaAlAs; directly modulated laser (DML); distributed feedback (DFB) lasers; push–pull driving;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2013.2290050
  • Filename
    6657685