DocumentCode
846515
Title
PD/SOI SRAM performance in presence of gate-to-body tunneling current
Author
Joshi, Rajiv V. ; Chuang, Ching-Te ; Fung, Samuel K H ; Assaderaghi, Fari ; Sherony, Melanie ; Yang, I. ; Shahidi, G.
Author_Institution
T. J. Watson Res. Center, IBM Res. Div., Yorktown Heights, NY, USA
Volume
11
Issue
6
fYear
2003
Firstpage
1106
Lastpage
1113
Abstract
This paper presents a detailed study on the effects of gate-to-body tunneling current on partially depleted silicon-on-insulator (PD/SOI) CMOS SRAM. It is shown that the presence of gate-to-body tunneling current changes the strength of individual cell transistor in the quiescent (standby) state, thus affecting subsequent write/read operations. The degradation in the "write" performance is shown to be more significant than the degradation in the "read" performance, and the effect is more pronounced at lowered temperature. For the beneficial side, the presence of the gate-to-body tunneling current reduces the initial cycle parasitic bipolar disturb from unselected cells on the same bitline during write/read operation.
Keywords
CMOS memory circuits; SRAM chips; elemental semiconductors; silicon; silicon-on-insulator; CMOS; SRAM; Si-SiO/sub 2/; gate-body tunnelling current; parasitic bipolar disturb; partially depleted-SOI; write-read operation; CMOS technology; Charge carrier processes; Circuits; Degradation; Partial discharges; Random access memory; Silicon on insulator technology; Temperature; Tunneling; Voltage;
fLanguage
English
Journal_Title
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher
ieee
ISSN
1063-8210
Type
jour
DOI
10.1109/TVLSI.2003.817552
Filename
1255484
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