DocumentCode :
846515
Title :
PD/SOI SRAM performance in presence of gate-to-body tunneling current
Author :
Joshi, Rajiv V. ; Chuang, Ching-Te ; Fung, Samuel K H ; Assaderaghi, Fari ; Sherony, Melanie ; Yang, I. ; Shahidi, G.
Author_Institution :
T. J. Watson Res. Center, IBM Res. Div., Yorktown Heights, NY, USA
Volume :
11
Issue :
6
fYear :
2003
Firstpage :
1106
Lastpage :
1113
Abstract :
This paper presents a detailed study on the effects of gate-to-body tunneling current on partially depleted silicon-on-insulator (PD/SOI) CMOS SRAM. It is shown that the presence of gate-to-body tunneling current changes the strength of individual cell transistor in the quiescent (standby) state, thus affecting subsequent write/read operations. The degradation in the "write" performance is shown to be more significant than the degradation in the "read" performance, and the effect is more pronounced at lowered temperature. For the beneficial side, the presence of the gate-to-body tunneling current reduces the initial cycle parasitic bipolar disturb from unselected cells on the same bitline during write/read operation.
Keywords :
CMOS memory circuits; SRAM chips; elemental semiconductors; silicon; silicon-on-insulator; CMOS; SRAM; Si-SiO/sub 2/; gate-body tunnelling current; parasitic bipolar disturb; partially depleted-SOI; write-read operation; CMOS technology; Charge carrier processes; Circuits; Degradation; Partial discharges; Random access memory; Silicon on insulator technology; Temperature; Tunneling; Voltage;
fLanguage :
English
Journal_Title :
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
1063-8210
Type :
jour
DOI :
10.1109/TVLSI.2003.817552
Filename :
1255484
Link To Document :
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