DocumentCode :
846708
Title :
Magnetization reversal processes in amorphous and polycrystalline Co-Si patterned nanowires
Author :
Morales, R. ; Martin, J.I. ; Velez, M. ; Alameda, J.M. ; Briones, F. ; Vicent, J.L.
Author_Institution :
Dept. de Fisica, Oviedo Univ., Spain
Volume :
38
Issue :
5
fYear :
2002
fDate :
9/1/2002 12:00:00 AM
Firstpage :
2565
Lastpage :
2567
Abstract :
Arrays of amorphous and polycrystalline CoxSi1-x nanowires have been prepared by electron beam lithography and a lift-off technique. The angular dependence of the magnetooptical transverse Kerr-effect hysteresis loops for both kind of samples has been compared in order to analyze the interplay between material microstructure and element shape at the submicrometric scale. The overall magnetic properties of the Co-Si nanowires are found to be dominated by patterning induced shape anisotropy, with the presence of coherent rotations in the magnetization reversal process in a wide angular range around the hard axis direction. It is found that the more homogenous microstructure of the amorphous samples results in a softer magnetic behavior and on a much better definition of the wires uniaxial anisotropy.
Keywords :
Kerr magneto-optical effect; amorphous magnetic materials; arrays; cobalt alloys; electron beam lithography; ferromagnetic materials; magnetic anisotropy; magnetic hysteresis; magnetic thin films; magnetisation reversal; nanostructured materials; silicon alloys; Co-Si; CoxSi1-x nanowires; CoSi; amorphous Co-Si patterned nanowires; angular dependence; arrays; coherent rotations; electron beam lithography; element shape; hard axis direction; induced shape anisotropy patterning; lift-off technique; magnetization reversal process; magnetization reversal processes; magnetooptical transverse Kerr-effect hysteresis loops; material microstructure; polycrystalline Co-Si patterned nanowires; softer magnetic behavior; submicrometric scale; uniaxial anisotropy; wide angular range; Amorphous materials; Anisotropic magnetoresistance; Electron beams; Lithography; Magnetic hysteresis; Magnetic materials; Magnetization reversal; Microstructure; Nanowires; Shape;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2002.801953
Filename :
1042268
Link To Document :
بازگشت