• DocumentCode
    846708
  • Title

    Magnetization reversal processes in amorphous and polycrystalline Co-Si patterned nanowires

  • Author

    Morales, R. ; Martin, J.I. ; Velez, M. ; Alameda, J.M. ; Briones, F. ; Vicent, J.L.

  • Author_Institution
    Dept. de Fisica, Oviedo Univ., Spain
  • Volume
    38
  • Issue
    5
  • fYear
    2002
  • fDate
    9/1/2002 12:00:00 AM
  • Firstpage
    2565
  • Lastpage
    2567
  • Abstract
    Arrays of amorphous and polycrystalline CoxSi1-x nanowires have been prepared by electron beam lithography and a lift-off technique. The angular dependence of the magnetooptical transverse Kerr-effect hysteresis loops for both kind of samples has been compared in order to analyze the interplay between material microstructure and element shape at the submicrometric scale. The overall magnetic properties of the Co-Si nanowires are found to be dominated by patterning induced shape anisotropy, with the presence of coherent rotations in the magnetization reversal process in a wide angular range around the hard axis direction. It is found that the more homogenous microstructure of the amorphous samples results in a softer magnetic behavior and on a much better definition of the wires uniaxial anisotropy.
  • Keywords
    Kerr magneto-optical effect; amorphous magnetic materials; arrays; cobalt alloys; electron beam lithography; ferromagnetic materials; magnetic anisotropy; magnetic hysteresis; magnetic thin films; magnetisation reversal; nanostructured materials; silicon alloys; Co-Si; CoxSi1-x nanowires; CoSi; amorphous Co-Si patterned nanowires; angular dependence; arrays; coherent rotations; electron beam lithography; element shape; hard axis direction; induced shape anisotropy patterning; lift-off technique; magnetization reversal process; magnetization reversal processes; magnetooptical transverse Kerr-effect hysteresis loops; material microstructure; polycrystalline Co-Si patterned nanowires; softer magnetic behavior; submicrometric scale; uniaxial anisotropy; wide angular range; Amorphous materials; Anisotropic magnetoresistance; Electron beams; Lithography; Magnetic hysteresis; Magnetic materials; Magnetization reversal; Microstructure; Nanowires; Shape;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2002.801953
  • Filename
    1042268