DocumentCode
847734
Title
Operating characteristics of a segmented hollow cathode over a wide pressure range
Author
Kirkici, Hulya ; Bruno, Donald
Author_Institution
Dept. of Electr. Eng., Auburn Univ., AL, USA
Volume
23
Issue
3
fYear
1995
fDate
6/1/1995 12:00:00 AM
Firstpage
229
Lastpage
234
Abstract
A segmented hollow cathode has been designed, constructed and operated over a wide pressure range from 1 mbar to 200 mbar to determine optimum operating characteristics for a series of unique applications. The device is designed for use as a plasma source for molecular gas lasers operating in the UV and visible spectra. The cathode consists of 1 mm thick nickel disks and 0.1 mm tungsten foil disk segments stacked alternately, forming a cylindrical geometry on its outer surface and a near-spherical geometry inside. The tungsten foil disk inner diameters vary along the longitudinal axis of the cathode. With this special geometric arrangement one hollow cathode structure is embedded within another. The spacing between the segments (tungsten foil disks) creates one hollow cathode geometry, and the spherical geometry formed by the inner diameter of the segments is a second hollow cavity. This design permits one to operate the device at an expanded pressure range. The device´s voltage and current characteristics are studied at different operating pressures and the optimum operating parameters such as pressure, voltage, current, and foil thickness are investigated. Helium, argon or a helium-argon mixture is used as the fill gas throughout the series of experiments
Keywords
cathodes; gas lasers; glow discharges; plasma production; 1 to 200 mbar; Ar; He; Ni disks; UV spectra; W foil disk segments; construction; current; current characteristics; design; foil thickness; molecular gas lasers; operating characteristics; optimum operating characteristics; plasma source; pressure; segmented hollow cathode; visible spectra; voltage; voltage characteristics; wide pressure range; Cathodes; Gas lasers; Geometrical optics; Geometry; Helium; Nickel; Optical design; Plasma sources; Tungsten; Voltage;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.402305
Filename
402305
Link To Document