DocumentCode :
84831
Title :
Characterization of Integrated Optical Strain Sensors Based on Silicon Waveguides
Author :
Westerveld, W.J. ; Leinders, S.M. ; Muilwijk, Pim M. ; Pozo, Jose ; van den Dool, Teun C. ; Verweij, M.D. ; Yousefi, M. ; Urbach, H.P.
Author_Institution :
Opt. Res. Group, Delft Univ. of Technol., Delft, Netherlands
Volume :
20
Issue :
4
fYear :
2014
fDate :
July-Aug. 2014
Firstpage :
101
Lastpage :
110
Abstract :
Microscale strain gauges are widely used in micro electro-mechanical systems (MEMS) to measure strains such as those induced by force, acceleration, pressure or sound. We propose all-optical strain sensors based on micro-ring resonators to be integrated with MEMS. We characterized the strain-induced shift of the resonances of such devices. Depending on the width of the waveguide and the orientation of the silicon crystal, the linear wavelength shift per applied strain varies between 0.5 and 0.75 pm/microstrain for infrared light around 1550 nm wavelength. The influence of the increasing ring circumference is about three times larger than the influence of the change in waveguide effective index, and the two effects oppose each other. The strong dispersion in 220 nm high silicon sub-wavelength waveguides accounts for a decrease in sensitivity of a factor 2.2 to 1.4 for waveguide widths of 310 nm to 860 nm. These figures and insights are necessary for the design of strain sensors based on silicon waveguides.
Keywords :
elemental semiconductors; integrated optics; micro-optics; micromechanical resonators; microsensors; optical resonators; optical sensors; optical waveguides; silicon; strain sensors; MEMS; Si; high silicon sub-wavelength waveguides; integrated optical strain sensors; micro electromechanical systems; micro-ring resonators; microscale strain gauges; silicon waveguides; wavelength 220 nm; wavelength 310 nm to 860 nm; Indexes; Optical ring resonators; Optical waveguides; Sensors; Silicon; Strain; Optical sensors; integrated optics; mechanical sensors; microsensors; optical waveguide; silicon-on-insulator; strain measurement;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2013.2289992
Filename :
6657704
Link To Document :
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