Title :
A new contact conductance measurement technique for metal-HTSC film contact
Author :
Apte, P.R. ; Kumar, D. ; Pinto, R. ; Sharon, M. ; Gupta, L.C. ; Vijayaraghavan, R.
Author_Institution :
Tata Inst. of Fundamental Res., Bombay, India
Abstract :
A four-point contact conductance measurement technique has been developed for measuring the contact conductance of the metal-HTSC film interface. A distributed RG model predicts a small nonzero (residual) resistance from which the contact conductance is determined. The measurement technique is described along with first results.<>
Keywords :
contact resistance; electric admittance measurement; electrical contacts; high-temperature superconductors; superconducting junction devices; superconducting thin films; Ag; Pd; Ti; contact conductance measurement technique; distributed RG model; four-point contact; metal-high T/sub c/ superconductor film contact; residual resistance; Conductive films; Contact resistance; Electrical resistance measurement; Measurement techniques; Roentgenium; Semiconductor films; Silver; Substrates; Superconducting films; Temperature;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
