Author :
Lee, H.S. ; Shin, D.H. ; Chun, Y.H. ; Kim, S.C. ; Lim, B.O. ; Baek, T.J. ; Kim, S.K. ; Park, H.C. ; Rhee, J.K.
Keywords :
III-V semiconductors; MIMIC; S-parameters; dielectric losses; gallium arsenide; micromachining; microstrip lines; GaAs; MEMS technology; MMIC compatible; S-parameter; air-bridge connection; air-gapped signal line; dielectric post; ground metal; integrated millimetre-wave circuits; low loss; surface micromachined microstrip line; wide characteristic impedance ranges;
