Title :
High-frequency microinductors with amorphous magnetic ground planes
Author :
Crawford, Ankur M. ; Gardner, Donald ; Wang, Shan X.
Author_Institution :
Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
fDate :
9/1/2002 12:00:00 AM
Abstract :
For the first time, inductors were fabricated on silicon using standard silicon processing tools. The 2.75 turn device exhibits a cutoff frequency of 3.3 GHz. The study incorporated ground planes of amorphous CoTaZr below and above the inductor. CoTaZr has a resistivity of ∼ 100 μΩ · cm, a 4π Ms of 15 kG, a permeability of ∼ 870 up to 1.4 GHz, and an Hc of 0.2 Oe (unpatterned film). These properties were monitored during the process and showed no signs of degradation, even after being exposed to process temperatures of 400°C. Octagonal devices with slotted ground planes had the best frequency response with a cutoff frequency of 3.3 GHz for inductors with 0.4-μm-thick ground planes. Maximum inductive enhancement (over air-core inductors) of 50%-60% has been measured for devices with 1 μm of CoTaZr underneath the inductor. Similarly, two layers of 0.4-μm CoTaZr exhibit increased inductance of 30%-40% with one ground plane and up to 150% with two ground planes.
Keywords :
amorphous magnetic materials; cobalt alloys; coercive force; electrical resistivity; ferromagnetic materials; inductors; magnetic permeability; magnetic thin film devices; tantalum alloys; zirconium alloys; 1.4 GHz; 3.3 GHz; 400 degC; CoTaZr; CoTaZr thin film; Si; amorphous magnetic ground plane; coercivity; cutoff frequency; electrical resistivity; frequency response; high-frequency microinductor; inductance; magnetic permeability; octagonal device; silicon processing; Amorphous magnetic materials; Amorphous materials; Conductivity; Cutoff frequency; Degradation; Inductors; Land surface temperature; Monitoring; Permeability; Silicon;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2002.802403