DocumentCode :
849762
Title :
Efficient Planar-Integrated Free-Space Optical Interconnects Fabricated by a Combination of Binary and Analog Lithography
Author :
Heming, Richard ; Wittig, Lars-Christian ; Dannberg, Peter ; Jahns, Jürgen ; Kley, Ernst-Bernhard ; Gruber, Matthias
Author_Institution :
Fak. fur Math. und Inf., Fern Univ. in Hagen, Hagen
Volume :
26
Issue :
14
fYear :
2008
fDate :
7/15/2008 12:00:00 AM
Firstpage :
2136
Lastpage :
2141
Abstract :
Design, fabrication, and experimental testing of an integrated microoptical module for interconnection are reported. The systems integration is based on the concept of planar-integrated free-space optics. The module combines diffractive-reflective and refractive microoptics. The diffractive elements were fabricated by binary lithography and reactive ion etching. The refractive elements were made by analog lithography using a high-energy beam sensitive mask and replication in Ormocer. The fabricated module implemented a simple one-dimensional optical interconnect. Two versions were implemented for which insertion losses of approximately 8 and 4.5 dB were measured, respectively.
Keywords :
diffractive optical elements; integrated optics; masks; micro-optics; optical communication; optical design techniques; optical fabrication; optical interconnections; optical losses; optical polymers; optical testing; photolithography; replica techniques; sputter etching; Ormocer; analog lithography; binary lithography; diffractive-reflective microoptics; diffractive-refractive microoptics; high-energy beam sensitive mask; insertion losses; integrated microoptical module design; optical fabrication; optical polymer; optical testing; planar-integrated free-space optical interconnects; reactive ion etching; replication technique; Integrated optics; Lithography; Microoptics; Optical device fabrication; Optical diffraction; Optical interconnections; Optical refraction; Optical sensors; Particle beam optics; Testing; Analog lithography; microoptics; optical interconnects; planar integration; replication;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2008.919456
Filename :
4609987
Link To Document :
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