• DocumentCode
    850336
  • Title

    High Dose Rate Burnout in Silicon Epitaxial Transistors

  • Author

    Wrobel, T.F. ; Azarewicz, J.L.

  • Author_Institution
    Mission Research Corporation La Jolla, California 92038
  • Volume
    27
  • Issue
    6
  • fYear
    1980
  • Firstpage
    1411
  • Lastpage
    1415
  • Abstract
    This paper presents experimental results for ionizing radiation-induced burnout in n-p-n transistors. The results indicate a dose-rate and a collector bias threshold for transistor burnout. The collector voltage threshold was shown to be on the order of 2/3 BVCEO and the dose-rate threshold was shown to be on the order of 2 × 1010 rad(Si)/s. The triggering mechanism was postulated to be caused by high current injection which results in avalanche breakdown fields developing across the n-n+ substrate boundary.
  • Keywords
    Avalanche breakdown; Capacitors; Charge carrier lifetime; Circuit testing; Doping; Gold; Ionizing radiation; Silicon; Substrates; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1980.4331042
  • Filename
    4331042