DocumentCode :
850435
Title :
The Role of Scattered Radiation in the Dosimetry of Small Device Structures
Author :
Garth, J.C. ; Burke, E.A. ; Woolf, S.
Author_Institution :
Rome Air Development Center, Deputy for Electronic Technology Solid State Sciences Division, Hanscom AFB, MA 01731
Volume :
27
Issue :
6
fYear :
1980
Firstpage :
1459
Lastpage :
1464
Abstract :
In very large scale integrated circuits (VLSI), multiple layers of different atomic number materials are separated by a few microns or less. When this type of structure is irradiated with high energy gamma rays, the transport of energy by energetic electrons must be taken into account. By comparing Monte Carlo calculations with experimental data, we show that it is essential to specify the low energy photon component of the gamma ray spectrum at the point of interest if accurate dose calculations are desired. In the case of silicon next to gold irradiated with a Cobalt-60 source, the silicon dose within a few microns of the interface can be twice as great as that derived from a calculation in which scattered radiation is neglected. The principal source of scattered radiation is the source material and holder, together with any intervening components such as a collimator. Backscattered gamma radiation, however, is also significant and subject to wide fluctuations under typical test conditions; it is most likely to produce large dose fluctuations within a few microns of an interface.
Keywords :
Atomic layer deposition; Atomic measurements; Dosimetry; Electromagnetic scattering; Electrons; Fluctuations; Gamma rays; Particle scattering; Silicon; Very large scale integration;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1980.4331051
Filename :
4331051
Link To Document :
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