Title :
Adjustment of laser facet film reflectivity by ablation etching
Author :
Takeshita, Tatsuya ; Sugo, Mitsuru ; Shibata, Yasuo ; Kamioka, Hiroyuki ; Tohmori, Yuichi
Author_Institution :
NTT Photonics Labs., NTT Corp., Kanagawa, Japan
Abstract :
We demonstrate reflectivity adjustment of a film-coated laser facet using ablation etching. The lasing is restrained by laser ablation etching of the facet film of a semiconductor laser and starts again with additional laser ablation etching. The laser ablation etching is useful not only for identifying more than λ0/(4nfilm) thickness of the coated film but also for adjusting facet coating thickness.
Keywords :
antireflection coatings; laser ablation; laser beam etching; optical fabrication; quantum well lasers; reflectivity; waveguide lasers; antireflection facet; film-coated laser facet; high reliability; laser ablation etching; reflectivity adjustment; ridge waveguide structure; semiconductor laser; spontaneous emission; strained-quantum well; Coatings; Etching; Laser ablation; Optical films; Optical pulses; Pulsed laser deposition; Reflectivity; Semiconductor films; Semiconductor lasers; Waveguide lasers;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2003.820462
