A Time-Dependent Collisional Sheath Model for Dual-Frequency Capacitively Coupled RF Plasma

Author

Rahman, M.T. ; Dewan, M.N.A. ; Ahmed, Arif ; Chowdhury, M.R.H.

Author_Institution

Dept. of Electr. & Electron. Eng., Bangladesh Univ. of Eng. & Technol. (BUET), Dhaka, Bangladesh

Volume

41

Issue

1

fYear

2013

fDate

Jan. 2013

Firstpage

17

Lastpage

23

Abstract

A time-dependent analytical model for capacitive sheath is developed for describing collisional radio-frequency sheath driven by two sinusoidal sources. In this model, it has been assumed that ion motion and velocity are time varying and sheath is collisional. The time-dependent terms in ion-fluid equations are ignored. Based on the assumption of steplike electron density profile model, analytical expressions for instantaneous sheath motion and sheath potential have been developed. The plasma-sheath motion and sheath potential are compared with a time-dependent model for collisionless and a time-independent model for collisional capacitively coupled plasma.

Keywords

plasma collision processes; plasma density; plasma sheaths; plasma sources; plasma transport processes; capacitive sheath; dual-frequency capacitively coupled RF plasma; ion motion; ion velocity; ion-fluid equations; plasma-sheath motion; steplike electron density profile model; time-dependent analytical model; time-dependent collisional sheath model; Analytical models; Electric potential; Ions; Mathematical model; Plasma density; Radio frequency; Capacitively coupled plasma (CCP); collisional sheath; dual frequency; radio-frequency (RF) sheath; time-dependent model;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2012.2227826

Filename

6374690