DocumentCode :
85323
Title :
Enhanced Light Output Power and Growth Mechanism of GaN-Based Light-Emitting Diodes Grown on Cone-Shaped {\\hbox {SiO}}_{2} Patterned Template
Author :
Da-Wei Lin ; Jhih-Kai Huang ; Chia-Yu Lee ; Ruey-Wen Chang ; Yu-Pin Lan ; Chien-Chung Lin ; Kang-Yuan Lee ; Chung-Hsiang Lin ; Po-Tsung Lee ; Gou-Chung Chi ; Hao-Chung Kuo
Author_Institution :
Dept. of Photonics, Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
9
Issue :
4
fYear :
2013
fDate :
Apr-13
Firstpage :
285
Lastpage :
291
Abstract :
In this study, we successfully transferred the patterns of a cone-shaped patterned sapphire substrate (CPSS) into SiO2 layer to fabricate a cone-shaped SiO2 patterned template by using nanoimprint lithography (NIL). The GaN-based light-emitting diodes (LEDs) were grown on this template by metal-organic chemical vapor deposition (MOCVD). The transmission electron microscopy (TEM) images suggest that the stacking faults formed near the cone-shaped SiO2 patterns during the epitaxial lateral overgrowth (ELOG) can effectively suppress the threading dislocations, which results in an enhancement of internal quantum efficiency. The Monte Carlo ray-tracing simulation reveals that the light extraction efficiency of the LED grown on cone-shaped SiO2 patterned template can be enhanced as compared with the LED grown on CPSS. As a result, the light output power of the LED grown on cone-shaped SiO2 patterned template outperformed the LED grown on CPSS.
Keywords :
MOCVD coatings; Monte Carlo methods; epitaxial growth; light emitting diodes; nanolithography; soft lithography; transmission electron microscopy; Al2O3; CPSS; GaN; Monte Carlo ray-tracing simulation; SiO2; cone shaped patterned sapphire substrate; cone shaped patterned template; enhanced light output power; epitaxial lateral overgrowth; growth mechanism; light emitting diodes; metal organic chemical vapor deposition; nanoimprint lithography; threading dislocation; transmission electron microscopy; Epitaxial growth; Gallium nitride; Laser excitation; Light emitting diodes; Power generation; Solid state lighting; Substrates; Epitaxial lateral overgrowth (ELOG); internal quantum efficiency (IQE); light extraction efficiency (LEE); light-emitting diodes (LEDs); nano-imprint lithography (NIL);
fLanguage :
English
Journal_Title :
Display Technology, Journal of
Publisher :
ieee
ISSN :
1551-319X
Type :
jour
DOI :
10.1109/JDT.2012.2230395
Filename :
6374704
Link To Document :
بازگشت