DocumentCode :
85349
Title :
Fabrication of Y-Splitters and Mach–Zehnder Structures on (Yb,Nb):RbTiOPO 
/RbTiOPO 
Author :
Butt, M.A. ; Sole, R. ; Pujol, M.C. ; Rodenas, A. ; Lifante, G. ; Choudhary, A. ; Murugan, G.S. ; Shepherd, D.P. ; Wilkinson, J.S. ; Aguilo, M. ; Diaz, F.
Author_Institution :
Fis. i Cristal·lografia de Mater. i Nanomater. & EMaS, Univ. Rovira i Virgili, Tarragona, Spain
Volume :
33
Issue :
9
fYear :
2015
fDate :
May1, 1 2015
Firstpage :
1863
Lastpage :
1871
Abstract :
Reactive ion etching of RbTiOPO4 (0 0 1) substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (0 0 1) epitaxial layers has been performed using fluorine chemistry. A maximum etch rate of 8.7 nm/min was obtained, and the deepest etch achieved was 3.5 μm. The (Yb,Nb)-doped epitaxial layers showed a slower etching rate when compared with undoped material. Liquid phase epitaxial growth of cladding layers has also been performed, resulting in a high-quality interface growth without appreciable defects. 9-mm-long Mach-Zehnder interferometer and 9-mm-long Y-splitter structures were designed and patterned in RbTiOPO4 substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (0 0 1) epitaxial layers. The structures fabricated in RbTiOPO4 substrates were filled with laser active (Yb,Nb):RbTiOPO4 higher refractive index core material, and finally an RbTiOPO4 cladding was grown on the samples. The refractive index difference between the (Yb,Nb):RbTiOPO4 layer and the RbTiOPO4 substrate at 1.5 μm has been measured and optical waveguiding at this wavelength has been demonstrated.
Keywords :
Mach-Zehnder interferometers; cladding techniques; epitaxial growth; epitaxial layers; niobium; optical beam splitters; optical fabrication; optical materials; optical multilayers; optical waveguides; refractive index; rubidium compounds; sputter etching; ytterbium; (Yb,Nb):RbTiOPO4/RbTiOPO4 (0 0 1) epitaxial layers; Mach-Zehnder interferometer; Mach-Zehnder structures; RbTiOPO4 (0 0 1) substrates; RbTiOPO4 cladding; RbTiOPO4:(Yb,Nb)-RbTiOPO4; Y-splitter fabrication; Y-splitter structures; cladding layers; etch rate; etching rate; fluorine chemistry; high-quality interface growth; higher refractive index core material; laser active (Yb,Nb):RbTiOPO4; liquid phase epitaxial growth; optical waveguiding; reactive ion etching; refractive index difference; size 9 mm; undoped material; wavelength 1.5 mum; Crystals; Epitaxial layers; Etching; Metals; Optical waveguides; Resists; Substrates; Integrated Optical Materials; Integrated optical materials; RbTiOPO4; Reactive Ion Etching; optical waves; reactive ion etching;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2014.2379091
Filename :
6980107
Link To Document :
