Title :
Magnetic properties of Fe-Ta-N-O film with high saturation flux density
Author :
Watanabe, Y. ; Oura, H. ; Onozato, N.
Author_Institution :
Central Res. & Dev. Center JVC, Kanagawa, Japan
fDate :
9/1/1990 12:00:00 AM
Abstract :
The magnetic properties and the microstructure of Fe-Ta-N-O film prepared by the facing targets sputtering method are reported. The addition of a small amount of Ta to Fe-N-O shown to improve the thermal stability of the magnetic properties at 600°C without a decrease in saturation flux density (Bs=19 kG). The microcrystallized state of Fe-Ta-N-O film observed by X-ray diffractometry is related to the good soft magnetic properties
Keywords :
X-ray diffraction examination of materials; crystal microstructure; ferromagnetic properties of substances; iron compounds; magnetic thin films; sputtered coatings; tantalum compounds; 600 degC; Fe-Ta-N-O film; X-ray diffractometry; facing targets sputtering method; high saturation flux density; magnetic properties; microcrystallized state; microstructure; thermal stability; Amorphous magnetic materials; Annealing; Coercive force; Magnetic films; Magnetic properties; Microstructure; Soft magnetic materials; Sputtering; Temperature; Thermal stability;
Journal_Title :
Magnetics, IEEE Transactions on
