• DocumentCode
    853872
  • Title

    Magnetic properties of Fe-Ta-N-O film with high saturation flux density

  • Author

    Watanabe, Y. ; Oura, H. ; Onozato, N.

  • Author_Institution
    Central Res. & Dev. Center JVC, Kanagawa, Japan
  • Volume
    26
  • Issue
    5
  • fYear
    1990
  • fDate
    9/1/1990 12:00:00 AM
  • Firstpage
    1500
  • Lastpage
    1502
  • Abstract
    The magnetic properties and the microstructure of Fe-Ta-N-O film prepared by the facing targets sputtering method are reported. The addition of a small amount of Ta to Fe-N-O shown to improve the thermal stability of the magnetic properties at 600°C without a decrease in saturation flux density (Bs=19 kG). The microcrystallized state of Fe-Ta-N-O film observed by X-ray diffractometry is related to the good soft magnetic properties
  • Keywords
    X-ray diffraction examination of materials; crystal microstructure; ferromagnetic properties of substances; iron compounds; magnetic thin films; sputtered coatings; tantalum compounds; 600 degC; Fe-Ta-N-O film; X-ray diffractometry; facing targets sputtering method; high saturation flux density; magnetic properties; microcrystallized state; microstructure; thermal stability; Amorphous magnetic materials; Annealing; Coercive force; Magnetic films; Magnetic properties; Microstructure; Soft magnetic materials; Sputtering; Temperature; Thermal stability;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.104429
  • Filename
    104429
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=853872