DocumentCode :
855233
Title :
Effect of very thin Cr underlayers on the micromagnetic structure of RF sputtered CoCrTa thin films
Author :
Yeh, T. ; Sivertsen, J.M. ; Judy, J.H.
Author_Institution :
Minnesota Univ., Minneapolis, MN, USA
Volume :
26
Issue :
5
fYear :
1990
fDate :
9/1/1990 12:00:00 AM
Firstpage :
1590
Lastpage :
1592
Abstract :
The effects of very thin Cr underlayers on the initial susceptibilities and micromagnetic structures of RF sputtered CoCrTa thin films have been studied. It was found that the initial susceptibility of the CoCrTa films on thin Cr underlayers is a factor of 2.5 to 3.5 times smaller than the value of the CoCrTa film without any Cr underlayer. The micromagnetic images of these CoCrTa films on thin Cr underlayers also exhibit a different feature from the CoCrTa film deposited on substrate with no Cr underlayer. The thicker the Cr underlayers, the finer are the micromagnetic images observed at both the as-deposited and the remanent state. It is very likely that the Cr underlayers induce stress in the CoCrTa/Cr double-layer thin films, and, through magnetoelastic interactions, the micromagnetic structures will be refined by the formation of barriers which pin the domain walls. This model could explain the low initial susceptibility and high in-plane coercivity in the RF-sputtered thin CoCrTa/Cr double layer films
Keywords :
chromium; chromium alloys; cobalt alloys; coercive force; magnetic domain walls; magnetic structure; magnetic susceptibility; magnetic thin films; magnetoelastic effects; remanence; sputtered coatings; tantalum alloys; Cr-CoCrTa; RF sputtered CoCrTa thin films; as deposited state; barrier formation; domain wall pinning; double-layer thin films; in-plane coercivity; induced stress; initial susceptibility; layer thickness; magnetoelastic interactions; micromagnetic structure; remanent state; very thin Cr underlayers; Chromium; Coercive force; Magnetic domain walls; Magnetic domains; Micromagnetics; Radio frequency; Sputtering; Stress; Substrates; Transistors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.104457
Filename :
104457
Link To Document :
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