DocumentCode :
855479
Title :
Increase of the Electrical Resistance of Thin Copper Film Due to 14 MeV Neutron Irradiation
Author :
Agrawal, S.K. ; Kumar, U. ; Singh, S.P. ; Nigam, A.K.
Author_Institution :
Van de Graaff Laboratory, Department of Physics Banaras Hindu University, Varanasi-221005(India)
Volume :
28
Issue :
2
fYear :
1981
fDate :
4/1/1981 12:00:00 AM
Firstpage :
1866
Lastpage :
1868
Abstract :
The variation in the electrical resistance of thin copper film (500 Ã… thick), grown on the glass slide has been measured with Increasing 14 MeV neutron Irradiation time. The electrical resistance vs irradiation time curveshows an Interesting behaviour after an irradiation of 40 minutes. However, there is a net increase in the electrical resistance with increasing neutron dose. The maximum increase in the observed electrical resistance after an irradiation of 115 mins, is 4.45%. The microstructural studies of irradiated film were made using TEM & TED techniques. The TEM patterns upto an irradiation time of 1.00 hr do not show any appreciable change in the microstructure. The TED patterns also do not show any appreciable change in the diffraction pattern upto an irradiation time of 1.0 hr. But after an irradiation time of 1.5 hrs, two extra rings appear In the TED pattern which disappear with increasing neutron irradiation time.
Keywords :
Copper; Diffraction; Electric resistance; Electric variables measurement; Electrical resistance measurement; Glass; Microstructure; Neutrons; Thickness measurement; Time measurement;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1981.4331542
Filename :
4331542
Link To Document :
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