• DocumentCode
    85564
  • Title

    Effects of Gate Field Plates on the Surface State Related Current Collapse in AlGaN/GaN HEMTs

  • Author

    Huolin Huang ; Liang, Yung C. ; Samudra, Ganesh S. ; Ting-Fu Chang ; Chih-Fang Huang

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore, Singapore
  • Volume
    29
  • Issue
    5
  • fYear
    2014
  • fDate
    May-14
  • Firstpage
    2164
  • Lastpage
    2173
  • Abstract
    During off-state, the influence of surface-trapped electron charges induced by high-field stress near the gate electrode of AlGaN/GaN power high-electron mobility transistor devices causes a reduction in two-dimensional electron gas (2DEG) carrier density at the heterointerface. In a pulse turn-on operation, the weakened 2DEG channel results in a higher on-state conduction resistance during the transient, known as the current collapse phenomenon. The phenomenon increases the switching loss by a higher on-state resistance and prolonged turn-on transition time, thus limits the device operating frequency range. In this paper, such a phenomenon is modeled, analyzed by Sentaurus TCAD simulation, and verified by the laboratory measurement data, with the emphasis on the influence of field plates toward the current collapse. The spatial distributions of trapped electrons and excess free electrons along the AlGaN surface are modeled and analyzed to arrive at the quantitative relationships among the trapped electron density, on-resistance increase, and the electric field distribution which provide a reliable criterion for current collapse reduction. It was found that, with a proper field plate design, it is possible to achieve an improvement on transient on-state resistance and the current recovery time.
  • Keywords
    III-V semiconductors; aluminium compounds; electric fields; gallium compounds; power HEMT; wide band gap semiconductors; 2DEG carrier density reduction; AlGaN-GaN; HEMT; Sentaurus TCAD simulation; current recovery time improvement; electric field distribution; excess free electrons; gate electrode; gate field plates; heterointerface; high-field stress; laboratory measurement data; power high-electron mobility transistor devices; pulse turn-on operation; spatial distributions; surface state related current collapse; surface-trapped electron charges; transient on-state resistance improvement; turn-on transition time; two-dimensional electron gas carrier density reduction; Aluminum gallium nitride; Electron traps; Gallium nitride; HEMTs; Logic gates; MODFETs; Stress; AlGaN/GaN high-electron mobility transistor (HEMT); GaN device modeling; current collapse; field plate design;
  • fLanguage
    English
  • Journal_Title
    Power Electronics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-8993
  • Type

    jour

  • DOI
    10.1109/TPEL.2013.2288644
  • Filename
    6657773