DocumentCode :
85574
Title :
Development of Heterojunction Back Contact Si Solar Cells
Author :
Nakamura, Jun ; Asano, Naoki ; Hieda, Tomohiro ; Okamoto, Chikao ; Katayama, Hiromi ; Nakamura, Kentaro
Author_Institution :
SHARP Corp., Katsuragi, Japan
Volume :
4
Issue :
6
fYear :
2014
fDate :
Nov. 2014
Firstpage :
1491
Lastpage :
1495
Abstract :
An energy conversion efficiency of 25.1% was achieved in heterojunction back contact (HBC) structure Si solar cell utilizing back contact technology and an amorphous silicon thinfilm technology. A new patterning process was established, and it was applied to the fabrication process of HBC cells. In addition, the unique technology of the surface mount technology concept contributed to the superior performance of HBC cell. A short circuit current density (Jsc) and an open-circuit voltage (Voc) were 41.7 mA/cm2 and 736 mV, respectively. The high Jsc as well as the high Voc indicates the strength of HBC structure cell. Besides, a high fill factor of 0.82 was obtained, which shows that HBC structure cell does not have any fundamental critical losses caused from series resistance or shunt resistance. Such high values of I-V parameter means that the patterning process was properly performed.
Keywords :
amorphous semiconductors; current density; electrical resistivity; elemental semiconductors; pattern formation; semiconductor heterojunctions; semiconductor thin films; silicon; solar cells; surface mount technology; I-V parameter; Si; amorphous silicon thin- film technology; back contact technology; critical losses; energy conversion efficiency; fill factor; heterojunction back contact Si solar cells; open-circuit voltage; patterning process; series resistance; short-circuit current density; shunt resistance; surface mount technology; voltage 736 mV; Heterojunctions; Passivation; Photovoltaic cells; Photovoltaic systems; Silicon; Back contact (BC); cell efficiency; heterojunction; patterning process; solar cell;
fLanguage :
English
Journal_Title :
Photovoltaics, IEEE Journal of
Publisher :
ieee
ISSN :
2156-3381
Type :
jour
DOI :
10.1109/JPHOTOV.2014.2358377
Filename :
6910211
Link To Document :
بازگشت