Heat treatment effects of CoCr sputtered films

Author

Jang, Mung Woo ; Lee, Taek Dong ; Kim, Young Ho ; Kang, Tak

Author_Institution

Div. of Metals, Korea Inst. of Sci. & Technol., Seoul, South Korea

Volume

26

Issue

5

fYear

1990

fDate

9/1/1990 12:00:00 AM

Firstpage

1623

Lastpage

1625

Abstract

Thermomagnetic analyses of RF-sputtered Co₈₄Cr₁₆ and Co₇₈Cr₂₂ thin films are reported. It is found that, when CoCr film is heated lower than the HCP→FCC transformation temperature, M_s drops substantially after holding at a constant temperature, and M_s at room temperature decreases after one cycle of heat treatment. This is due to Cr redistribution from the Cr-rich region of the film. When CoCr is heated higher than the HCP→FCC transformation temperature, M _s jumps sharply after holding at a constant temperature. This is due to the formation of an FCC phase with high M_s at higher temperature. A study of the angular dependence of coercivity indicates that the demagnetization mechanism of as-sputtered film seems to be an incoherent rotation mechanism while for the heat-treated film it may be domain wall motion or another combined mechanism. The perpendicular anisotropy in the Cr film may be connected with the existence of a highly Cr segregated region as well as c-axis alignments

Keywords

chromium alloys; cobalt alloys; coercive force; crystal orientation; demagnetisation; magnetic anisotropy; magnetic domain walls; magnetic thin films; magnetisation; segregation; sputtered coatings; thermomagnetic treatment; CoCr sputtered films; Cr redistribution; Cr segregated region; HCP→FCC transformation temperature; angular dependence; c-axis alignments; coercivity; demagnetization mechanism; domain wall motion; heat treatment; incoherent rotation mechanism; magnetisation; perpendicular anisotropy; thermomagnetic analysis; Annealing; Chromium; Coercive force; Heat treatment; Heating; Magnetic analysis; Magnetic films; Sputtering; Substrates; Temperature;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.104468

Filename

104468