Title :
A 48-turn thin film head for 150 Mb/in2 recording
Author :
Ohdoi, Y. ; Morikawa, K. ; Horibata, S. ; Suzuki, S. ; Shibata, H.
Author_Institution :
Mitsubishi Electr. Corp., Hyogo, Japan
fDate :
9/1/1990 12:00:00 AM
Abstract :
A 48-turn thin-film head has been developed. The copper coils were electroplated through minute resist frames which were fabricated by a reactive ion etching (RIE) process. The problem of the redeposited copper underlayer in the RIE was solved using ECR (electron cyclotron resonance) plasma equipment. The output voltage of the 48-turn head was in proportion to the track width and number of coil turns. With a 6.5-μm track width head, a recording density of 150 Mb/in2 was achieved
Keywords :
magnetic heads; magnetic thin film devices; 6.5 micron; Cu coils; electroplated; reactive ion etching; recording density; resist frames; track width; Coils; Copper; Cyclotrons; Electrons; Etching; Magnetic heads; Plasma applications; Resists; Resonance; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
