The role of magnet arrangement in synthesis of YBCO thin films by on-axis DC magnetron sputtering

Author

Zhang, Y.Z. ; Yeh, W.J.

Author_Institution

Dept. of Phys., Idaho Univ., Moscow, ID, USA

Volume

5

Issue

2

fYear

1995

fDate

6/1/1995 12:00:00 AM

Firstpage

1517

Lastpage

1520

Abstract

We have investigated various processes of DC magnetron sputtering films with on-axis geometry. The study shelved that the quality of YBCO thin films not only depended on the sputtering parameters such as gas pressure, DC voltage, and substrate temperature, but also depended on the structure of the magnetron sputtering gun. A variety of magnet configurations have been tested. We have identified several magnet arrangements with which high quality YBCO thin films could be obtained. With suitable magnet arrangements and optimal sputtering parameters, large area and high quality YBCO thin films could be fabricated with T/sub c/s about 90 K, J/sub c/s of 10/sup 6/ A/cm/sup 2/ at 77 K and zero field, and the transition width less than 1 K.<>

Keywords

barium compounds; critical current density (superconductivity); high-temperature superconductors; sputter deposition; superconducting thin films; superconducting transition temperature; yttrium compounds; 77 K; 90 K; DC magnetron sputtering; DC voltage; YBCO thin films; YBaCuO; critical temperature; gas pressure; magnet configurations; magnetron sputtering gun structure; on-axis geometry; substrate temperature; superconducting critical current; transition width; Argon; Geometry; Physics; Semiconductor thin films; Sputtering; Substrates; Superconducting magnets; Superconducting thin films; Voltage; Yttrium barium copper oxide;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.402860

Filename

402860