• DocumentCode
    858141
  • Title

    The Cornell Electron Beam Ion Source

  • Author

    Kostroun, V.O. ; Ghanbari, E. ; Beebe, E.N. ; Janson, S.W.

  • Author_Institution
    Nuclear Science and Engineering Program, Ward Laboratory Cornell University, Ithaca, New York 14853
  • Volume
    28
  • Issue
    3
  • fYear
    1981
  • fDate
    6/1/1981 12:00:00 AM
  • Firstpage
    2660
  • Lastpage
    2662
  • Abstract
    An electron beam ion source (EBIS) for the production of low energy, multiply charged ion beams to be used in atomic physics experiments has been designed and constructed. An external high perveance electron gun is used to launch the electron beam into a conventional solenoid. Novel features of the design include a distributed sputter ion pump to create the ultrahigh vacuum environment in the ionization region of the source and microprocessor control of the axial trap voltage supplies.
  • Keywords
    Atomic beams; Electron beams; Ion beams; Ion sources; Ionization; Microprocessors; Physics; Production; Solenoids; Voltage control;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1981.4331789
  • Filename
    4331789
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=858141