Title :
Electrothermal Simulation and Thermal Performance Study of GaN Vertical and Lateral Power Transistors
Author :
Yuhao Zhang ; Min Sun ; Zhihong Liu ; Piedra, Daniel ; Hyung-Seok Lee ; Feng Gao ; Fujishima, Tatsuya ; Palacios, T.
Author_Institution :
Microsyst. Technol. Labs., Massachusetts Inst. of Technol., Cambridge, MA, USA
Abstract :
In this paper, we present self-consistent electrothermal simulations of single-finger and multifinger GaN vertical metal-oxide-semiconductor field-effect transistors (MOSFETs) and lateral AlGaN/GaN high-electron-mobility transistors (HEMTs) and compare their thermal performance. The models are first validated by comparison with experimental dc characteristics, and then used to study the maximum achievable power density of the device without the peak temperature exceeding a safe operation limit of 150°C (P150°C). It is found that the vertical MOSFETs have the potential to achieve a higher P150°C than the lateral HEMTs, especially for higher breakdown voltages and higher scaling level designs.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; power HEMT; power MOSFET; semiconductor device models; thermal engineering; wide band gap semiconductors; AlGaN-GaN; HEMT; MOSFET; breakdown voltages; experimental dc characteristics; higher scaling level designs; lateral high-electron-mobility transistors; lateral power transistors; multifinger vertical metal-oxide-semiconductor field-effect transistors; power density; self-consistent electrothermal simulations; single-finger vertical metal-oxide-semiconductor field-effect transistors; thermal performance study; vertical power transistors; Electrothermal simulation; GaN high-electron-mobility transistor (HEMT); GaN metal-oxide-semiconductor field-effect transistor (MOSFET); power electronics; thermal performance;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2013.2261072