• DocumentCode
    858272
  • Title

    Control of M-H Loop Shape in Perpendicular Recording Media by Ion Implantation

  • Author

    Choi, Chulmin ; Hong, Daechoon ; Gapin, Andrew I. ; Jin, Sungho

  • Author_Institution
    Center for Magnetic Recording Res., California Univ., San Diego, La Jolla, CA
  • Volume
    43
  • Issue
    6
  • fYear
    2007
  • fDate
    6/1/2007 12:00:00 AM
  • Firstpage
    2121
  • Lastpage
    2123
  • Abstract
    We have investigated the properties of CoCrPt-SiO2 perpendicular recording media as influenced by Co ion implantation, and have shown that a substantial change of the M-H loop squareness and a control of coercivity (Hc) over a wide range are feasible. Thin films of Ta(5 nm)/Ru(20 nm)/CoCrPt-SiO 2 (15 nm) were deposited and then subjected to the ion implantation with various acceleration energies, doses, and incident angles. It has been found that the cobalt ion implantation significantly alters the magnetic properties of CoCrPt-SiO 2. In the case of the near-perpendicular implantation at 60 KV, the M-H loop became much squarer but there was a decrease of coercivity 4300 to 2100 Oe. There was no noticeable decrease of the saturation magnetization by implantation. The reason for the significantly increased squareness by near-perpendicular implantation is mainly attributed to the increase of exchange coupling between the grains by cobalt ion implantation
  • Keywords
    chromium alloys; cobalt alloys; coercive force; exchange interactions (electron); ion implantation; magnetic hysteresis; magnetic multilayers; magnetic thin films; metallic thin films; perpendicular magnetic recording; platinum alloys; ruthenium; silicon compounds; tantalum; 60 kV; M-H loop squareness; Ta-Ru-CoCrPt-SiO2; acceleration energy; coercivity; exchange coupling; ion implantation; magnetic properties; perpendicular recording media; saturation magnetization; thin films; Acceleration; Cobalt; Coercive force; Ion implantation; Magnetic properties; Materials science and technology; Perpendicular magnetic recording; Saturation magnetization; Shape control; Sputtering; Ion implantation; magnetization reversal; perpendicular magnetic recording;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2007.892640
  • Filename
    4202666