DocumentCode :
858272
Title :
Control of M-H Loop Shape in Perpendicular Recording Media by Ion Implantation
Author :
Choi, Chulmin ; Hong, Daechoon ; Gapin, Andrew I. ; Jin, Sungho
Author_Institution :
Center for Magnetic Recording Res., California Univ., San Diego, La Jolla, CA
Volume :
43
Issue :
6
fYear :
2007
fDate :
6/1/2007 12:00:00 AM
Firstpage :
2121
Lastpage :
2123
Abstract :
We have investigated the properties of CoCrPt-SiO2 perpendicular recording media as influenced by Co ion implantation, and have shown that a substantial change of the M-H loop squareness and a control of coercivity (Hc) over a wide range are feasible. Thin films of Ta(5 nm)/Ru(20 nm)/CoCrPt-SiO 2 (15 nm) were deposited and then subjected to the ion implantation with various acceleration energies, doses, and incident angles. It has been found that the cobalt ion implantation significantly alters the magnetic properties of CoCrPt-SiO 2. In the case of the near-perpendicular implantation at 60 KV, the M-H loop became much squarer but there was a decrease of coercivity 4300 to 2100 Oe. There was no noticeable decrease of the saturation magnetization by implantation. The reason for the significantly increased squareness by near-perpendicular implantation is mainly attributed to the increase of exchange coupling between the grains by cobalt ion implantation
Keywords :
chromium alloys; cobalt alloys; coercive force; exchange interactions (electron); ion implantation; magnetic hysteresis; magnetic multilayers; magnetic thin films; metallic thin films; perpendicular magnetic recording; platinum alloys; ruthenium; silicon compounds; tantalum; 60 kV; M-H loop squareness; Ta-Ru-CoCrPt-SiO2; acceleration energy; coercivity; exchange coupling; ion implantation; magnetic properties; perpendicular recording media; saturation magnetization; thin films; Acceleration; Cobalt; Coercive force; Ion implantation; Magnetic properties; Materials science and technology; Perpendicular magnetic recording; Saturation magnetization; Shape control; Sputtering; Ion implantation; magnetization reversal; perpendicular magnetic recording;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2007.892640
Filename :
4202666
Link To Document :
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