Title :
A layout structure for matching many integrated resistors
Author :
Van der Wagt, J. Paul A ; Chu, Gordon G. ; Conrad, Christine L.
Author_Institution :
Rockwell Sci. Corp., Thousand Oaks, CA, USA
Abstract :
A proposed mirrored shuffle layout pattern cancels systematic resistor gradient variations up to second order and allows monolithic integration of hundreds of matched resistors for precision analog circuits. A test circuit uses 15 000 subresistors and three levels of interconnect to form 150 main resistors in a 2.85×0.83 mm2 area. It demonstrates better than 11-b matching. The dominant remaining error is related to a layout artifact external to the core resistor array, and after separation the resistor array itself achieves over 13-b matching. Wafer maps show significant first- and second-order resistor value gradients that are cancelled to within the measurement error.
Keywords :
VLSI; analogue integrated circuits; analogue-digital conversion; digital-analogue conversion; integrated circuit layout; measurement errors; resistors; ADC; DAC; automated test; integrated circuit layout; layout artifact; layout structure; many integrated resistors matching; mirrored shuffle layout pattern; monolithic integration; passive circuits; precision analog circuits; systematic resistor gradient variations; wafer maps; Analog integrated circuits; Area measurement; Bipolar transistors; Circuit testing; Digital integrated circuits; Digital-analog conversion; Integrated circuit layout; Resistors; Thermal stresses; Voltage;
Journal_Title :
Circuits and Systems I: Regular Papers, IEEE Transactions on
DOI :
10.1109/TCSI.2003.821303