DocumentCode :
858712
Title :
AFM and TEM studies on high-quality Bi-2223 thin films grown by MOCVD
Author :
Endo, K. ; Shimizu, T. ; Matsuhata, H. ; Teherani, F.H. ; Yoshida, S. ; Tokumoto, H. ; Kajimura, K. ; Nakamura, K. ; Fueki, K.
Author_Institution :
Electrotech. Lab., Tsukuba, Japan
Volume :
5
Issue :
2
fYear :
1995
fDate :
6/1/1995 12:00:00 AM
Firstpage :
1675
Lastpage :
1679
Abstract :
AFM and TEM observations of high- quality Bi-2223 thin films grown by MOCVD have been carried out to elucidate the crystal growth mechanism and the effect of surface structures on superconducting properties. AFM images of the film surfaces grown on flat planes (off-angle <0.3 deg.) of LaAlO/sub 3/, SrTiO/sub 3/ and MgO [001] substrates clearly showed a 2-dimensional nucleation growth. In contrast, those on vicinal planes (off-angle-3 deg.) of LaAlO/sub 3/, SrTiO/sub 3/ and Nd:YAlO/sub 3/ [001] substrates showed a step flow growth. The films grown on LaAlO/sub 3/, SrTiO/sub 3/ and Nd:AlO/sub 3/ showed the highest T/sub c(0/) of 97 K reported for as-grown BSCCO films. In addition, a TEM plan-view image of the film grown on [001] LaAlO/sub 3/ showed clearly the misfit dislocation network running along the orthogonal [110] directions at the heterointerface and having Burger´s vectors b=1/2[110]. The clear AFM images of regularly-shaped terraces or step-edges and the distinct TEM image of the misfit dislocation network are evidence of high-quality MOCVD grown Bi-2223 films.<>
Keywords :
atomic force microscopy; bismuth compounds; calcium compounds; chemical vapour deposition; dislocations; high-temperature superconductors; strontium compounds; superconducting thin films; superconducting transition temperature; surface structure; transmission electron microscopy; 2D nucleation; AFM; Bi/sub 2/Sr/sub 2/Ca/sub 2/Cu/sub 3/O; LaAlO/sub 3/[001] substrates; MOCVD; MgO[001] substrates; Nd:YAlO/sub 3/[001] substrates; SrTiO/sub 3/ substrates; TEM; crystal growth mechanism; high temperature superconductor; misfit dislocation network; step flow growth; surface structure; thin films; Atomic force microscopy; Bismuth compounds; High temperature superconductors; MOCVD; Substrates; Superconducting films; Superconducting thin films; Surface morphology; Transistors; Yttrium barium copper oxide;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.402898
Filename :
402898
Link To Document :
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