Title :
Fabrication and basic characteristics of dry-etched micro inductors
Author :
Yamaguchi, M. ; Matsumoto, N. ; Ohzeki, H. ; Arai, K.I.
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
fDate :
9/1/1990 12:00:00 AM
Abstract :
Thin-film meander inductors having 10-6-m-range coil spacing were fabricated successfully by a dry-etching technique. The inductance measured with a microstrip line increased with coil spacing due to dielectric coupling between the meander lines. The maximum value of the applicable current density was examined, and it was clarified that magnetic thin films are required to provide high saturation magnetization in order to remain in the undersaturated region in case of high current density applications. It is concluded that these results provide a basis for developing thin-film micro inductors and transformers
Keywords :
inductance measurement; inductors; magnetic thin film devices; magnetisation; sputter etching; Cu; SEM; coil spacing; current density; dielectric coupling; dry-etched micro inductors; dry-etching technique; inductance; magnetic thin films; microstrip line; permalloy film; saturation magnetization; thin film meander inductors; thin-film micro inductors; transformers; Coils; Current density; Dielectric measurements; Dielectric thin films; Fabrication; Inductance measurement; Magnetic films; Microstrip; Saturation magnetization; Thin film inductors;
Journal_Title :
Magnetics, IEEE Transactions on
