Results of modeling laser-induced plasma in pulsed laser deposition

Author

Granse, G. ; Völlmar, S.

Author_Institution

Fraunhofer-Inst. fur Werkstoffphys. und Schichttechnol., Dresden, Germany

Volume

24

Issue

1

fYear

1996

fDate

2/1/1996 12:00:00 AM

Firstpage

47

Lastpage

48

Abstract

Pulsed laser deposition (PLD) as a method for thin-film deposition is distinguished by high energy and density of the short-time particle flow. By interaction of the laser radiation with the solid and the expanding cloud, a more or less ionized plasma is formed, depending on the wavelength and pulse shape. The properties of the deposit depend essentially on the properties of the plasma, as energy content, density, degree of ionization, and composition. Because of the complexity of the phenomena involved, controlling the particle flow requires experimental analysis as well as theoretical modeling. The visualization of some experiment-related results of theoretical modeling is shown for irradiation of Al targets with different lasers and regimes

Keywords

plasma deposition; plasma production by laser; pulsed laser deposition; Al; Al target irradiation; deposit properties; expanding cloud; high energy; high energy and density; ionized plasma; laser-induced plasma; particle flow; pulse shape; pulsed laser deposition; short-time particle flow; solid; thin-film deposition; visualization; Clouds; Ionizing radiation; Laser modes; Optical pulses; Plasma density; Plasma properties; Plasma waves; Pulsed laser deposition; Solid lasers; Sputtering;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.491684

Filename

491684