DocumentCode :
859656
Title :
Results of modeling laser-induced plasma in pulsed laser deposition
Author :
Granse, G. ; Völlmar, S.
Author_Institution :
Fraunhofer-Inst. fur Werkstoffphys. und Schichttechnol., Dresden, Germany
Volume :
24
Issue :
1
fYear :
1996
fDate :
2/1/1996 12:00:00 AM
Firstpage :
47
Lastpage :
48
Abstract :
Pulsed laser deposition (PLD) as a method for thin-film deposition is distinguished by high energy and density of the short-time particle flow. By interaction of the laser radiation with the solid and the expanding cloud, a more or less ionized plasma is formed, depending on the wavelength and pulse shape. The properties of the deposit depend essentially on the properties of the plasma, as energy content, density, degree of ionization, and composition. Because of the complexity of the phenomena involved, controlling the particle flow requires experimental analysis as well as theoretical modeling. The visualization of some experiment-related results of theoretical modeling is shown for irradiation of Al targets with different lasers and regimes
Keywords :
plasma deposition; plasma production by laser; pulsed laser deposition; Al; Al target irradiation; deposit properties; expanding cloud; high energy; high energy and density; ionized plasma; laser-induced plasma; particle flow; pulse shape; pulsed laser deposition; short-time particle flow; solid; thin-film deposition; visualization; Clouds; Ionizing radiation; Laser modes; Optical pulses; Plasma density; Plasma properties; Plasma waves; Pulsed laser deposition; Solid lasers; Sputtering;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.491684
Filename :
491684
Link To Document :
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