• DocumentCode
    859953
  • Title

    Effect of Interfacial Spin Flip and Momentum Scattering on Magnetoresistance

  • Author

    Kumar, S. Bala ; Tan, S.G. ; Jalil, M.B.A.

  • Author_Institution
    Data Storage Inst., Nat. Univ. of Singapore
  • Volume
    43
  • Issue
    6
  • fYear
    2007
  • fDate
    6/1/2007 12:00:00 AM
  • Firstpage
    2863
  • Lastpage
    2865
  • Abstract
    In this paper, we have developed a model and performed a numerical analysis using the spin-drift diffusion method to study the effect of interfacial spin scattering on the magnetoresistance of a simple trilayer spin-valve structure. We have modelled the interfaces as ultra-thin layers, in the limit of the layer thickness approaching zero. Our analysis is focused on three important interfacial parameters, i.e., interfacial resistance (RI), interfacial spin selectivity (gamma), and interfacial spin-flip parameter (zeta). We compared the relative contribution of bulk scattering (BS) and interfacial scattering (IS) to the overall MR. We have noticed that when gamma is greater (smaller) than a critical value, gammaC, then MR increases with increasing (decreasing) RI. Contrary to general expectation, larger ferromagnetic (FM) resistivity results in lower MR if gamma>gammaC. Finally, we have shown the effect of zeta on MR. At high (low) zeta, which signifies spin coherence at the interface is conserved (depolarized), MR increases (decreases). We have also noted the competition between gamma and zeta in contributing towards overall MR. We have also shown that the negative effect on MR due to spin flip can be minimized by using higher RI
  • Keywords
    diffusion; ferromagnetism; magnetoresistance; spin valves; bulk scattering; ferromagnetic resistivity; interfacial resistance; interfacial spin scattering; interfacial spin-flip parameter; magnetoresistance; momentum scattering; spin-drift diffusion method; trilayer spin-valve structure; Computer interfaces; Conductivity; Current density; Laboratories; Magnetic materials; Magnetoresistance; Material storage; Memory; Polarization; Scattering; Interfacial resistance; interfacial spin flip; magnetoresistance (MR);
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2007.892570
  • Filename
    4202816